Company Filing History:
Years Active: 1992-1994
Title: Fourmun Lee: Innovator in Phase-Shift Mask Technology
Introduction
Fourmun Lee is a notable inventor based in Chandler, AZ (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of phase-shift mask technologies. With a total of 3 patents to his name, Lee's work has had a substantial impact on the industry.
Latest Patents
Lee's latest patents include innovative methods for fabricating phase-shift masks. One of his patents describes a method for creating a phase-shift mask that involves depositing a semitransparent layer onto a mask plate and patterning it into a predetermined geometric design. This process enhances the functionality of the mask in semiconductor applications. Another patent focuses on forming right angles on a chromeless phase-shift mask, strategically positioning phase-shift elements to eliminate hot spot formation, which can lead to unintentional exposure of the semiconductor substrate.
Career Highlights
Fourmun Lee is currently employed at Motorola Corporation, where he continues to advance his research and development efforts. His work at Motorola has allowed him to collaborate with leading experts in the field, further enhancing the quality and impact of his inventions.
Collaborations
Some of Lee's notable coworkers include Thomas E. Zirkle and James G. Gilbert. Their collaborative efforts have contributed to the successful development of innovative technologies in the semiconductor industry.
Conclusion
Fourmun Lee's contributions to phase-shift mask technology exemplify the importance of innovation in the semiconductor field. His patents not only showcase his expertise but also highlight the collaborative nature of technological advancement.