Company Filing History:
Years Active: 2017
Title: Fouad Atrash: Innovator in X-ray Fluorescence Analysis
Introduction
Fouad Atrash is a notable inventor based in Akko, Israel. He has made significant contributions to the field of X-ray fluorescence analysis, particularly in the accurate determination of thickness and elemental composition of small features on thin substrates. His innovative approach has the potential to enhance various applications in material science and engineering.
Latest Patents
Fouad Atrash holds a patent for a method titled "Method for accurately determining the thickness and/or elemental composition of small features on thin-substrates using micro-XRF." This method involves directing an X-ray beam onto a sample and measuring an XRF signal excited from the sample. The process includes a reference measurement with one or more first layers formed on a substrate and a target measurement after additional layers are formed. The reference XRF spectrum is used to reduce the contribution of the first layers in the target XRF spectrum, allowing for the estimation of parameters of the second layers.
Career Highlights
Fouad Atrash is currently associated with Bruker JV Israel Ltd., where he applies his expertise in X-ray fluorescence analysis. His work has been instrumental in advancing the capabilities of micro-XRF technology, making it more effective for various industrial applications.
Collaborations
Fouad has collaborated with notable colleagues, including Isaac Mazor and Alex Tokar. Their combined efforts contribute to the innovative research and development at Bruker JV Israel Ltd.
Conclusion
Fouad Atrash is a distinguished inventor whose work in X-ray fluorescence analysis is paving the way for advancements in material characterization. His contributions are vital to the ongoing evolution of analytical techniques in science and industry.