Raniganj, India

Firdos Khan

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Firdos Khan: Innovator in GaN Technology

Introduction

Firdos Khan is a notable inventor based in Raniganj, India. He has made significant contributions to the field of electronic devices, particularly in the integration of Gallium Nitride (GaN) technology. His innovative work has led to the development of a unique patent that enhances the performance of power electronic systems.

Latest Patents

Firdos Khan holds a patent for a "Gate bias circuit for a driver monolithically integrated with a GaN power FET." This electronic device features a GaN power FET and a GaN driver that are coupled together and monolithically integrated on a single GaN die. The gate bias circuit is predominantly integrated on this die and includes only one active component external to it. In various embodiments, this external component can be a linear regulator, a shunt regulator, or a Zener diode. This innovation represents a significant advancement in the efficiency and functionality of GaN-based electronic devices.

Career Highlights

Throughout his career, Firdos Khan has focused on the development of advanced electronic systems. His work has been instrumental in pushing the boundaries of GaN technology, which is known for its high efficiency and performance in power applications. His patent reflects his commitment to innovation and excellence in the field.

Collaborations

Firdos Khan has collaborated with notable colleagues, including Manish N Shah and Rajesh Ghosh. These partnerships have contributed to the successful development of his patented technology and have fostered a collaborative environment for innovation.

Conclusion

Firdos Khan is a distinguished inventor whose work in GaN technology has led to significant advancements in electronic devices. His patent showcases his innovative spirit and dedication to improving power electronic systems. His contributions will undoubtedly influence the future of this technology.

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