Moscow, Russia

Filipp B Vurzel

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 1979.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Filipp B Vurzel. Retrieved from https://idiyas.com/inventor/filipp-b-vurzel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 29(Granted Patents)


Company Filing History:

goldMedal1 out of 834,601 
Other
 patents

Years Active: 1979

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1 patent (USPTO):Explore Patents

Title: Filipp B Vurzel: Innovator in Plasmochemical Reactor Technology

Introduction

Filipp B Vurzel is a notable inventor based in Moscow, Russia. He has made significant contributions to the field of gas heating technologies, particularly through his innovative methods in plasmochemical reactors. His work focuses on enhancing the production of lower olefins and industrial hydrogen from hydrocarbon stock.

Latest Patents

Filipp B Vurzel holds a patent for a method of heating gas in an electric arc plasmochemical reactor. This method involves mixing a chemically reactant ionized gas with an intermediate heat carrier gas plasma jet, which is then heated further using a rotary electric arc. This innovative approach aims to improve efficiency in the production of valuable chemical compounds.

Career Highlights

Throughout his career, Vurzel has demonstrated a commitment to advancing technology in the chemical engineering sector. His patent reflects his expertise and innovative thinking in the field, showcasing his ability to address complex challenges in gas heating processes.

Collaborations

Filipp B Vurzel has collaborated with esteemed colleagues such as Valentin V Dementiev and Rafail Izrailevich Levenzon. These partnerships have contributed to the development and refinement of his innovative technologies.

Conclusion

Filipp B Vurzel is a prominent figure in the realm of plasmochemical reactor technology, with a focus on improving gas heating methods. His contributions are paving the way for advancements in chemical production processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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