Zugliano, Italy

Ferruccio D Vedova

This inventor holds 1 USPTO granted patent. Top assignee: Ceda, S.p.a.. Active years: 1982.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ferruccio D Vedova. Retrieved from https://idiyas.com/inventor/ferruccio-d-vedova

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1982

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1 patent (USPTO):Explore Patents

Title: Ferruccio D Vedova: Innovator in Level Measurement Technology

Introduction

Ferruccio D Vedova is a notable inventor based in Zugliano, Italy. He has made significant contributions to the field of level measurement technology. His innovative approach has led to the development of a unique device that enhances the safety and efficiency of measuring various substances.

Latest Patents

Ferruccio D Vedova holds a patent for a level measurement device. This device is designed to measure the level of any substance, including potentially dangerous materials. It features an intense light source that illuminates a specific area on the surface of the medium being measured. The device includes a receiver-perceptor processor that operates at an angle to the light source's optical axis. Additionally, it incorporates regulating means that respond to ambient light and infrared rays, as well as alarm and regulation features.

Career Highlights

Ferruccio D Vedova has worked with Ceda, S.p.a., where he has applied his expertise in developing advanced measurement technologies. His career is marked by a commitment to innovation and safety in industrial applications.

Collaborations

Due to space limitations, the collaborations section will be omitted.

Conclusion

Ferruccio D Vedova's contributions to level measurement technology exemplify his dedication to innovation and safety. His patented device represents a significant advancement in the field, showcasing his expertise and commitment to improving measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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