This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Entic Research and Training Center Bv. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Fergio Sismono: Innovator in Cochlear Implant Technology
Introduction
Fergio Sismono is a notable inventor based in Berchem, Belgium. He has made significant contributions to the field of medical technology, particularly in the development of cochlear implants. His innovative approach has led to advancements that enhance the quality of life for individuals with hearing impairments.
Latest Patents
Fergio Sismono holds a patent for a method titled "Method for deriving information for fitting a cochlear implant." This method focuses on deriving information necessary for setting fitting parameters of a cochlear implant, which includes an electrode array with multiple stimulating electrode contacts. The process involves modeling the interface between an electrode contact and cochlear tissue as an electrical circuit, determining impedance values, and mapping these values to a mathematical model to optimize fitting parameters.
Career Highlights
Throughout his career, Sismono has been dedicated to improving cochlear implant technology. His work has not only contributed to the scientific community but has also had a profound impact on patients who rely on these devices for better hearing. His innovative methods are paving the way for future advancements in the field.
Collaborations
Fergio Sismono has collaborated with esteemed colleagues such as Andrzej Zarowski and Erwin Offeciers. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas, further enhancing the development of cochlear implant technology.
Conclusion
Fergio Sismono's contributions to cochlear implant technology exemplify the importance of innovation in medical devices. His patented methods are crucial for improving the fitting and effectiveness of cochlear implants, ultimately benefiting those with hearing loss.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile