This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Xiamen Changelight Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Fengjie Lin and Micro Light-Emitting Element Innovation.
Introduction
Fengjie Lin is an inventor associated with Xiamen, China, and Xiamen Changelight Co., Ltd. His listed patent focuses on micro light-emitting elements and their preparation.
Latest Patents
Lin is credited with 1 patent: “Micro Light Emitting Element and Its Preparation Method.” The disclosure describes a micro light-emitting element, a method for manufacturing it, and a light-emitting device. Its design uses a stacked DBR adhesive layer, DBR reflective layer, and DBR sacrificial layer. The adhesive layer helps improve coverage of the reflective layer, while the layers’ differing densities are intended to produce sequentially decreasing etching rates. This etching process forms an inverted trapezoidal through-hole with an inclined sidewall.
Career Highlights
Lin’s listed patent reflects work on the structure and fabrication of micro light-emitting elements. The invention addresses DBR layer coverage and the formation of a shaped through-hole during etching.
Collaborations
Lin’s listed coworkers include Hongyi Zhou and Weiwen Liu. The patent information provided does not specify their individual contributions.
Conclusion
Fengjie Lin’s recorded patent highlights a micro light-emitting element design that combines layered DBR structures with controlled etching to shape a through-hole.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile