Location History:
- Tainan Hsien, TW (2000)
- An-Ding Hsiang, TW (2001)
Company Filing History:
1 out of 7,085 
1 out of 832,843 Years Active: 2000-2001
Title: Innovations by Feng-Yeu Shau
Introduction
Feng-Yeu Shau is a notable inventor based in An-Ding Hsiang, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in chemical mechanical polishing processes. With a total of 2 patents, his work has advanced the efficiency and effectiveness of semiconductor wafer processing.
Latest Patents
Feng-Yeu Shau's latest patents include innovative methods and apparatuses that enhance the chemical mechanical polishing of semiconductor wafers. One of his patents focuses on magnetic filtration for slurry used in chemical mechanical polishing. This invention involves the use of magnets along the piping network between a slurry reservoir and the CMP apparatus. The magnets attract iron oxide particles from the slurry, preventing them from causing defects during the polishing process.
Another significant patent is a method of detecting the endpoint and monitoring uniformity in chemical-mechanical polishing. This method utilizes a series of scanning operations to generate multiple reflectance line spectra during the polishing of a metallic layer over a substrate. The standard deviation of the reflectance spectra serves as a polishing index, helping to determine the polishing endpoint and monitor surface uniformity.
Career Highlights
Feng-Yeu Shau has worked with prominent companies in the semiconductor industry, including United Microelectronics Corporation. His experience in these organizations has contributed to his expertise in the field and the development of his patented technologies.
Collaborations
Throughout his career, Feng-Yeu Shau has collaborated with notable colleagues such as Champion Yi and Ming-Cheng Yang. These partnerships have fostered innovation and the sharing of ideas within the semiconductor manufacturing community.
Conclusion
Feng-Yeu Shau's contributions to the semiconductor industry through his patents and collaborations highlight his role as an influential inventor. His innovative approaches to chemical mechanical polishing continue to impact the efficiency of semiconductor wafer processing.