Hsinchu, Taiwan

Feng-Mei Wu

This inventor holds 1 USPTO granted patent. Top assignee: Industrial Technology Research Institute. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Feng-Mei Wu. Retrieved from https://idiyas.com/inventor/feng-mei-wu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Innovations by Feng-Mei Wu in Inkjet Technology

Introduction

Feng-Mei Wu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of inkjet technology, particularly with his innovative patent related to photocurable pigment type inkjet ink compositions. His work is instrumental in advancing the capabilities of inkjet printing.

Latest Patents

Feng-Mei Wu holds a patent for a photocurable pigment type inkjet ink composition. This composition includes 5 to 95 wt % of water, 0.5 to 20 wt % of a pigment, 1 to 70 wt % of a photocurable component, and 0.0001 to 30 wt % of a reactive surfactant. The reactive surfactant serves as a pigment dispersant for dispersing pigment particles or as an emulsifier for emulsifying the photocurable component. This innovation enhances the performance and versatility of inkjet printing technologies.

Career Highlights

Feng-Mei Wu is associated with the Industrial Technology Research Institute, where he continues to develop and refine his inventions. His work has garnered attention for its practical applications in various industries, particularly in printing technology.

Collaborations

Feng-Mei Wu collaborates with talented individuals such as Chi-Jung Chang and Shu-chen Tsou, who contribute to the research and development efforts in their field.

Conclusion

Feng-Mei Wu's contributions to inkjet technology through his innovative patent demonstrate his commitment to advancing the industry. His work not only showcases his inventive spirit but also highlights the importance of collaboration in achieving technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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