Nanjing, China

Feng Fu

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Feng Fu. Retrieved from https://idiyas.com/inventor/feng-fu-bvkiohhr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Innovations by Feng Fu: A Glimpse into His Contributions

Introduction

Feng Fu is an accomplished inventor based in Nanjing, China. He has made significant contributions to the field of technology, particularly in the area of displaying contact information through innovative methods and apparatuses. His work reflects a blend of creativity and technical expertise.

Latest Patents

Feng Fu holds a patent for a "Method and apparatus for displaying contact information based on an image embedded with contact information." This invention involves a method that includes displaying an image, detecting when a preset region of the image is selected, and subsequently displaying the contact information corresponding to that region when selected. This innovative approach enhances the way contact information is accessed and utilized.

Career Highlights

Feng Fu is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology. His work at such a prestigious company underscores his expertise and the value of his contributions to the industry.

Collaborations

Feng Fu has collaborated with talented individuals such as Xinyan Mei and Quan Ma. These collaborations have likely enriched his work and fostered a creative environment for innovation.

Conclusion

Feng Fu's innovative patent and his role at Samsung Electronics Co., Ltd. highlight his significant contributions to technology. His work not only showcases his inventiveness but also reflects the potential for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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