Changhua, Taiwan

Feng-Che Tsai

This inventor holds 1 USPTO granted patent. Top assignee: National Central University. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Feng-Che Tsai. Retrieved from https://idiyas.com/inventor/feng-che-tsai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Feng-Che Tsai

Introduction

Feng-Che Tsai is a notable inventor based in Changhua, Taiwan. He has made significant contributions to the field of abrasive fabrication, showcasing his expertise through his innovative patent. His work is particularly relevant in industries that require precision polishing and grinding techniques.

Latest Patents

Feng-Che Tsai holds a patent for a "Method of fabricating abrasive having sliding and grinding effects." This invention involves the fabrication of an abrasive that achieves both sliding and grinding effects. The abrasive consists of grinding particles that are wrapped in a specialized wrapping material. This innovative approach allows for the fine polishing of various sizes and shapes of molds and micro components, resulting in mirror-grade surfaces.

Career Highlights

Feng-Che Tsai is affiliated with National Central University, where he continues to advance his research and development in abrasive technologies. His work has garnered attention for its practical applications in enhancing the quality of surface finishes in various manufacturing processes.

Collaborations

Feng-Che Tsai has collaborated with esteemed colleagues, including Biing-Hwa Yan and Li-Wen Sun. These partnerships have contributed to the advancement of research in abrasive technologies and have fostered a collaborative environment for innovation.

Conclusion

Feng-Che Tsai's contributions to the field of abrasive fabrication highlight his innovative spirit and dedication to advancing technology. His patent demonstrates the potential for improved manufacturing processes, making a significant impact in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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