Stäfa, Switzerland

Felix Walser

This inventor holds 1 USPTO granted patent. Top assignee: Staubli Ag. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Felix Walser. Retrieved from https://idiyas.com/inventor/felix-walser-w78j7621

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Felix Walser: Innovator in Yarn Layer Technology

Introduction

Felix Walser is a notable inventor based in Stäfa, Switzerland. He has made significant contributions to the field of textile technology, particularly in methods related to yarn layers. His innovative approach has led to the development of a unique patent that enhances the efficiency of yarn handling.

Latest Patents

Felix Walser holds a patent for a "Method and device for fixing the ends of a yarn layer wound in an." This invention addresses challenges in the textile industry, providing a solution that improves the stability and usability of yarn layers.

Career Highlights

Felix is currently employed at Stäubli AG, a company renowned for its advanced textile machinery and automation solutions. His work at Stäubli AG has allowed him to apply his inventive skills in a practical setting, contributing to the company's reputation for innovation in the textile sector.

Collaborations

Felix collaborates with Martin Plaschy, a fellow innovator at Stäubli AG. Their partnership exemplifies the spirit of teamwork in driving technological advancements within the industry.

Conclusion

Felix Walser's contributions to yarn layer technology through his patent and work at Stäubli AG highlight his role as an influential inventor in the textile field. His innovative methods continue to shape the future of yarn handling and textile machinery.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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