Gui'an, China

Feiyang Pan

This inventor holds 1 USPTO granted patent. Top assignee: Huawei Cloud Computing Technologies. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Feiyang Pan. Retrieved from https://idiyas.com/inventor/feiyang-pan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Feiyang Pan: Innovator in Page Layout Technology

Introduction

Feiyang Pan is a notable inventor based in Gui'an, China. He has made significant contributions to the field of page layout technology. His innovative approach utilizes advanced algorithms to enhance the efficiency of page design.

Latest Patents

Feiyang Pan holds a patent for a "Page layout method and apparatus." This patent involves a sophisticated process that includes obtaining page information, element information of at least one page element to be laid out, and a layout rule. The method employs a reinforcement learning algorithm to generate candidate page layout policies and utilizes an imitation learning algorithm to determine the target page layout policy.

Career Highlights

Feiyang Pan is currently employed at Huawei Cloud Computing Technologies. His work at this leading technology company allows him to explore and develop innovative solutions in cloud computing and page layout methodologies.

Collaborations

Feiyang collaborates with talented individuals such as Jia He and Xin Jin, who contribute to his projects and enhance the overall innovation process.

Conclusion

Feiyang Pan's contributions to page layout technology exemplify the impact of innovative thinking in the tech industry. His work continues to influence advancements in cloud computing and design methodologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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