Vernon, CT, United States of America

Feiyang Chen

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: University of Connecticut. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Feiyang Chen. Retrieved from https://idiyas.com/inventor/feiyang-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Feiyang Chen and Sheet-Stabilized Emulsion Inks.

Introduction

Feiyang Chen is an inventor associated with the University of Connecticut and based in Vernon, Connecticut. His patent work concerns conductive inks made using water-in-oil emulsions stabilized by sheets exfoliated from layered materials.

Latest Patents

Chen is associated with 1 patent, titled “Two-Dimensional Sheet Stabilized Emulsion Based Inks.” The disclosure describes methods for fabricating and using inks based on water-in-oil emulsions stabilized by sheets of layered materials, including substantially pristine, non-oxidized graphite or hexagonal boron nitride. It also explains that long-chain alkanes, such as hexadecane, can help produce viscous, stable emulsions suitable for printing electrically conductive or insulating lines and shapes.

Career Highlights

The patent highlights an approach to ink formulation that uses exfoliated material sheets to stabilize emulsions. The described method offers a potential route to producing printable conductive and insulating patterns.

Collaborations

The supplied information identifies Douglas H. Adamson and Elizabeth Brown as Chen’s coworkers. The patent disclosure also reflects research connected with the University of Connecticut.

Conclusion

Feiyang Chen’s patent focuses on sheet-stabilized emulsion inks and methods for using them to print conductive or insulating patterns.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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