Shenzhen, China

Fei Xue

USPTO Granted Patents = 3 

 

Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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3 patents (USPTO):Explore Patents

Title: Fei Xue: Innovator in Antenna Measurement Technologies

Introduction

Fei Xue is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of antenna measurement technologies, holding a total of 3 patents. His innovative approaches have enhanced the efficiency and accuracy of measuring total radiated power in array antennas.

Latest Patents

One of Fei Xue's latest patents is a method, apparatus, and system for measuring the total radiated power of an array antenna. This invention includes determining a Rayleigh resolution of the array antenna in an angle space and setting a stepping grid spacing of sampling points according to this resolution. The method involves measuring equivalent isotropic radiated power (EIRP) at the sampling points and determining the total radiated power (TRP) based on the EIRP. Compared to traditional methods that use a 15° angle stepping grid, this approach significantly reduces measurement errors. Additionally, through a normalized wave vector space transformation, the number of sampling points is further minimized, improving measurement efficiency.

Career Highlights

Fei Xue has worked with notable companies in the technology sector, including ZTE Corporation and Xi'an Zhongxing New Software Co., Ltd. His experience in these organizations has contributed to his expertise in antenna technologies and innovations.

Collaborations

Fei Xue has collaborated with several professionals in his field, including Yanchun Zhuang and Hua Gao. These collaborations have fostered a productive environment for innovation and development in antenna measurement technologies.

Conclusion

Fei Xue's contributions to the field of antenna measurement are noteworthy, and his patents reflect his commitment to advancing technology. His work continues to influence the industry, paving the way for more efficient measurement techniques.

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