Sunnyvale, CA, United States of America

Fei Xie


Average Co-Inventor Count = 1.4

ph-index = 5

Forward Citations = 67(Granted Patents)


Company Filing History:


Years Active: 2006-2024

where 'Filed Patents' based on already Granted Patents

11 patents (USPTO):

Title: Innovator Fei Xie: Advancements in Plasma Technology

Introduction

Fei Xie, an accomplished inventor based in Sunnyvale, CA, has made significant contributions to the field of plasma technology. With a total of 11 patents to his name, Xie's work has paved the way for advancements that enhance the stability and efficiency of plasma reactors.

Latest Patents

Among his notable inventions are two recent patents that reflect his innovative approach to plasma generation. The first patent addresses controlling exhaust gas pressure of a plasma reactor for plasma stability. This invention describes a plasma generating system that incorporates several components, including a waveguide for transmitting microwave energy, a plasma chamber for generating plasma, and a pressure control device to manage exhaust gas pressure. Such a system enhances the stability of plasma reactors, crucial for various applications.

The second patent focuses on an optical system for monitoring plasma reactions and reactors. This invention includes a detection unit capable of measuring light intensities in both ultraviolet and infrared ranges, allowing for real-time monitoring of plasma conditions. The integration of this optical system into plasma generating technologies represents a significant leap in operational monitoring.

Career Highlights

Throughout his career, Fei Xie has worked with esteemed firms such as Broadcom Corporation and Recarbon Corp. His tenure at these organizations has allowed him to refine his expertise in plasma technologies and contribute to impactful projects that shape the industry.

Collaborations

Xie has collaborated with valuable professionals in his field, including coworkers Curtis Peter Tom and Stefan Andrew McClelland. Their combined efforts have facilitated innovations that enhance the performance and safety of plasma reactors across applications.

Conclusion

Fei Xie's innovative spirit and dedication to advancing plasma technology are evident in his patented inventions and collaborative efforts. As emerging technologies continue to evolve, his contributions will undoubtedly have a lasting impact on the industry, paving the way for future advancements in plasma generation and its applications.

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