Singapore, Singapore

Fei Qin

This inventor holds 1 USPTO granted patent. Top assignee: Wd Media, LLC. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fei Qin. Retrieved from https://idiyas.com/inventor/fei-qin-msfzsvry

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Fei Qin: Innovator in Magnetic Recording Technologies

Introduction

Fei Qin is a prominent inventor based in Singapore, known for his contributions to the field of magnetic recording technologies. With a focus on enhancing the performance of magnetic recording media, he has made significant strides in the development of innovative systems and methods.

Latest Patents

Fei Qin holds a patent for "Systems and methods for providing high performance soft magnetic underlayers for magnetic recording media." This patent describes a magnetic recording medium that includes a substrate and an amorphous soft magnetic underlayer composed of CoFeMoNb. Notably, the atomic percent of Mo is greater than about 8, and the atomic percent of Nb is greater than about 9, with a magnetic recording layer positioned on top of the soft magnetic underlayer. He has 1 patent to his name.

Career Highlights

Fei Qin is currently employed at Wd Media, LLC, where he continues to push the boundaries of magnetic recording technology. His work has been instrumental in advancing the efficiency and effectiveness of magnetic recording media.

Collaborations

Fei Qin has collaborated with notable professionals in his field, including Iwao Okamoto and Debashish Tripathy. These collaborations have further enriched his research and development efforts.

Conclusion

Fei Qin's innovative work in magnetic recording technologies exemplifies his commitment to advancing the field. His contributions, particularly through his patent, highlight the importance of ongoing research and development in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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