Shanghai, China

Fei Nie

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2014-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fei Nie. Retrieved from https://idiyas.com/inventor/fei-nie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 5.1

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2014-2020

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2 patents (USPTO):Explore Patents

Title: Fei Nie - Innovator in Inkjet Media Management

Introduction

Fei Nie is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of inkjet media management, holding a total of 2 patents. His work focuses on improving the efficiency and quality of inkjet printing processes.

Latest Patents

One of Fei Nie's latest patents is related to "Partially dried inkjet media output management." This invention includes a device designed to manage partially dried inkjet media by utilizing a starwheel positioned on one side, which works in conjunction with rollers on the opposite side to corrugate the media effectively. Another notable patent is for an "Imaging device," which further enhances the capabilities of inkjet printing technology.

Career Highlights

Fei Nie is currently employed at Hewlett-Packard Development Company, L.P., where he continues to innovate and develop new technologies in the printing industry. His expertise and dedication have made him a valuable asset to the company.

Collaborations

Fei has collaborated with talented coworkers such as Su Nick and Jing Jing Zhang, contributing to a dynamic and innovative work environment.

Conclusion

Fei Nie's contributions to inkjet media management demonstrate his commitment to advancing printing technology. His patents reflect a deep understanding of the challenges in the industry and a drive to create effective solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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