Chengdu, China

Fei Ma

USPTO Granted Patents = 6 

 

Average Co-Inventor Count = 4.7

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Lexington, MA (US) (2011)
  • Chengdu, CN (2021 - 2023)

Company Filing History:


Years Active: 2011-2023

Loading Chart...
Loading Chart...
6 patents (USPTO):Explore Patents

Title: Fei Ma: Innovator in Semiconductor Technology

Introduction

Fei Ma is a prominent inventor based in Chengdu, China, known for his significant contributions to semiconductor technology. With a total of six patents to his name, he has made remarkable advancements in the field, particularly in the design and functionality of semiconductor devices.

Latest Patents

Fei Ma's latest patents include innovative designs such as the trench shield isolation layer and a semiconductor device that incorporates a lateral insulator. The trench shield isolation layer patent describes a semiconductor device featuring an MOS transistor, where a trench in the substrate extends into the semiconductor material. This design includes a shield within the trench, which is electrically isolated from the gate of the MOS transistor. The second patent focuses on a semiconductor device that includes a trench with a shield and a lateral insulator, enhancing the device's performance and reliability.

Career Highlights

Fei Ma is currently employed at Texas Instruments Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing devices that are not only efficient but also innovative in their design.

Collaborations

Fei Ma has collaborated with notable colleagues such as Hong Yang and Seetharaman Sridhar, contributing to various projects that enhance semiconductor technology.

Conclusion

Fei Ma's contributions to the field of semiconductor technology through his patents and work at Texas Instruments Corporation highlight his role as a leading inventor. His innovative designs continue to shape the future of semiconductor devices.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…