Eindhoven, Netherlands

Fei Liu

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):

Title: Fei Liu: Innovator in Lithographic Measurement Technologies

Introduction

Fei Liu is a prominent inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of lithography, particularly in the measurement of focus performance in lithographic processes. His innovative work has led to the development of a patented method that enhances the precision of device manufacturing.

Latest Patents

Fei Liu holds a patent for "Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method." This patent discloses a method for focus measurement of a lithographic process. The method involves receiving a substrate with a metrology pattern printed by a lithographic apparatus, illuminating the pattern with a metrology tool, and measuring a signal based on radiation scattered by the pattern. The focus of the lithographic process is determined or monitored based on the measured signal, with the position of the metrology pattern being focus dependent. Notably, part of the metrology pattern is printed using an angular asymmetric illumination pupil. Fei Liu has 1 patent to his name.

Career Highlights

Fei Liu is associated with ASML Netherlands B.V., a leading company in the development of lithography systems for the semiconductor industry. His work at ASML has positioned him as a key player in advancing lithographic technologies, contributing to the efficiency and accuracy of semiconductor manufacturing.

Collaborations

Fei Liu has collaborated with notable colleagues, including Jin Lian and Zhuangxiong Huang. These collaborations have fostered innovation and have been instrumental in the development of advanced lithographic measurement techniques.

Conclusion

Fei Liu's contributions to lithographic measurement technologies exemplify the impact of innovative thinking in the semiconductor industry. His patented methods enhance the precision of lithographic processes, showcasing the importance of continuous innovation in technology.

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