Jiangsu, China

Fei Dong

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Jiangsu University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fei Dong. Retrieved from https://idiyas.com/inventor/fei-dong-wbfwtkd4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Fei Dong and His Patent for a Two-Stage Jet Device

Introduction

Fei Dong is an inventor based in Jiangsu, China, and is associated with Jiangsu University. His patent work includes a two-stage jet device designed with an adjustable flow-guide structure.

Latest Patents

Dong is listed as an inventor on 1 patent: “Two-stage jet device with flow guide structure.” The device includes a cavity with two gas inlets and a nozzle assembly comprising first- and second-stage nozzles. The second-stage nozzle can move axially within the first-stage nozzle, allowing the second gas inlet to connect with one or two jet channels. Guide vanes are positioned in the first gas inlet and the mixing cavity’s suction cavity. A control system adjusts the rotatable vane in the suction cavity according to the position of the second-stage nozzle.

Career Highlights

Dong’s documented patent contribution concerns jet-device design, particularly the coordination of nozzle position, gas flow paths, and adjustable guide vanes. His listed institutional affiliation is Jiangsu University.

Collaborations

Bifeng Yin and Hekun Jia are identified as Dong’s coworkers. They are also associated with the patent’s inventor team.

Conclusion

Fei Dong’s patent describes an adjustable two-stage jet device that combines movable nozzle components with controlled guide vanes to manage gas flow.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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