Sturbridge, MA, United States of America

Fatima Toor


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Fatima Toor

Introduction

Fatima Toor is a prominent inventor based in Sturbridge, MA (US). She has made significant contributions to the field of materials science, particularly in the area of silicon surface etching. Her innovative methods aim to enhance the efficiency of silicon surfaces, which are crucial in various technological applications.

Latest Patents

Fatima Toor holds a patent for her invention titled "Copper-assisted, anti-reflection etching of silicon surfaces." This method involves the electroless deposition of copper nanoparticles, approximately 20 nanometers in size, on silicon surfaces to reduce reflectivity. The process includes positioning the silicon substrate in a vessel filled with an etching solution, which consists of an oxidant-etchant solution, such as an aqueous mixture of hydrofluoric acid and hydrogen peroxide. The etching is facilitated by agitating the solution, potentially using ultrasonic agitation, and may involve heating the solution and directing light onto the silicon surface. The copper nanoparticles play a crucial role in enhancing the etching process.

Career Highlights

Fatima Toor is associated with the Alliance for Sustainable Energy, LLC, where she continues to develop innovative solutions in her field. Her work focuses on improving the efficiency and effectiveness of silicon surfaces, which are vital in the semiconductor industry and renewable energy technologies.

Collaborations

Fatima collaborates with Howard M. Branz, a fellow researcher, to further advance their work in silicon surface technologies. Their partnership exemplifies the importance of teamwork in driving innovation and achieving significant breakthroughs in materials science.

Conclusion

Fatima Toor's contributions to the field of silicon surface etching demonstrate her commitment to innovation and sustainability. Her patented methods not only enhance the performance of silicon surfaces but also pave the way for advancements in various technological applications.

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