The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2014
Filed:
Mar. 19, 2012
Fatima Toor, Sturbridge, MA (US);
Howard Branz, Boulder, CO (US);
Fatima Toor, Sturbridge, MA (US);
Howard Branz, Boulder, CO (US);
Alliance for Sustainable Energy, LLC, Golden, CO (US);
Abstract
A method () for etching a silicon surface () to reduce reflectivity. The method () includes electroless deposition of copper nanoparticles about 20 nanometers in size on the silicon surface (), with a particle-to-particle spacing of 3 to 8 nanometers. The method () includes positioning () the substrate () with a silicon surface () into a vessel (). The vessel () is filled () with a volume of an etching solution () so as to cover the silicon surface (). The etching solution () includes an oxidant-etchant solution (), e.g., an aqueous solution of hydrofluoric acid and hydrogen peroxide. The silicon surface () is etched () by agitating the etching solution () with, for example, ultrasonic agitation, and the etching may include heating () the etching solution () and directing light () onto the silicon surface (). During the etching, copper nanoparticles enhance or drive the etching process.