Rabama, Sri Lanka

Fathimathul Freena

This inventor holds 1 USPTO granted patent. Top assignee: Ansell Limited. Active years: 2021.


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Fathimathul Freena: Innovator in Safety Glove Technology

Introduction

Fathimathul Freena is a notable inventor based in Rabama, LK. He has made significant contributions to the field of safety equipment, particularly through his innovative designs in safety gloves. His work focuses on enhancing user safety while maintaining functionality.

Latest Patents

Fathimathul Freena holds a patent for safety gloves with a tear-away feature. This invention includes a seamless knitted liner that forms the glove, incorporating various knitted zones with different fabric densities. The design allows for a four-finger tear susceptibility of about 200 Newtons or less, ensuring that the safety zone includes the fingers. This innovative approach enhances the usability and safety of gloves in various applications.

Career Highlights

Freena is currently associated with Ansell Limited, a company known for its commitment to safety and quality in protective equipment. His work at Ansell Limited has allowed him to develop and refine his innovative ideas, contributing to the company's reputation in the industry.

Collaborations

Throughout his career, Fathimathul Freena has collaborated with talented individuals such as Mario Emanuel Camargo Martinez and Rathnaweera Patabendige Santhushta Rathnaweera. These collaborations have fostered a creative environment that encourages innovation and the development of new safety technologies.

Conclusion

Fathimathul Freena's contributions to safety glove technology exemplify his dedication to innovation and user safety. His patent for safety gloves with a tear-away feature showcases his ability to combine functionality with safety, making a significant impact in the field.

Profile summary based on public USPTO records.
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