Shenzhen, China

Fangyun Wei

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: China Rare Earth Radimag (Shenzhen) Technology Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fangyun Wei. Retrieved from https://idiyas.com/inventor/fangyun-wei

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Fangyun Wei and Advances in Sintered Magnet Technology.

Introduction

Fangyun Wei is an inventor based in Shenzhen, China. His work includes a patent for a permeating treatment method for radially oriented sintered magnets, as well as related magnet and permeation-composition technologies.

Latest Patents

Wei’s patent, “Permeating Treatment Method for Radially Oriented Sintered Magnet, Magnet, and Composition for Magnet Permeation,” describes a process in which the magnet and target permeation source remain in relative motion during treatment. The method is intended to address internal defects and improve the coercivity and thermal stability of oriented sintered magnets. Its stated advantages include controllable, uniform permeation; compatibility with high-viscosity or low-melting-point sources; efficient use of permeation elements; and potential suitability for industrial production. Wei is associated with 1 patent.

Career Highlights

Wei is associated with China Rare Earth Radimag (Shenzhen) Technology Co., Ltd. His patented work focuses on improving the performance and manufacturability of radially oriented sintered magnets.

Collaborations

Wei’s listed coworkers include Wenhao Cheng and Zoucheng Cheng.

Conclusion

Fangyun Wei’s patent centers on a controlled permeation approach designed to improve the stability and performance of sintered magnets while supporting efficient industrial use.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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