Beijing, China

Fangqing Wen

This inventor holds 1 USPTO granted patent. Top assignee: Boe Technology Group. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fangqing Wen. Retrieved from https://idiyas.com/inventor/fangqing-wen-m6sd4aav

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Fangqing Wen: Innovator in Display Technology

Introduction

Fangqing Wen is a prominent inventor based in Beijing, China. He has made significant contributions to the field of display technology, particularly through his innovative work on metal oxide thin film transistors. His inventions aim to enhance the stability and performance of semiconductor devices and display devices.

Latest Patents

Fangqing Wen holds a patent for a metal oxide thin film transistor, semiconductor device, and display device. This patent addresses the issue of poor stability in current metal oxide thin film transistors. The invention includes a substrate and a first metal oxide semiconductor layer, where the material of the first layer is a metal oxide doped with a first metal element. The electronegativity difference value between the first metal element and oxygen is greater than or equal to that of the metal element in the metal oxide and oxygen.

Career Highlights

Fangqing Wen is associated with BOE Technology Group, a leading company in the display technology sector. His work has been instrumental in advancing the capabilities of display devices, making them more reliable and efficient.

Collaborations

Fangqing Wen collaborates with talented individuals such as Jiayu He and Ce Ning. Their combined expertise contributes to the innovative projects at BOE Technology Group.

Conclusion

Fangqing Wen's contributions to display technology through his patent on metal oxide thin film transistors highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor devices and display technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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