Taichung, Taiwan

Fang-Hsuan Su

This inventor holds 1 USPTO granted patent. Top assignee: National Chung Hsing University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fang-Hsuan Su. Retrieved from https://idiyas.com/inventor/fang-hsuan-su-5whvrjqs

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Fang-Hsuan Su: Inventor of a Brightness Enhancement Film

Introduction

Fang-Hsuan Su is an inventor associated with Taichung, Taiwan, and National Chung Hsing University. Her work includes a patented optical film design intended to improve the performance of light-emitting modules. The patent record provided lists 1 patent.

Latest Patents

Su’s patent, “Brightness Enhancement Film,” describes a light-transmissive substrate placed on the light-exiting surface of a light-emitting module. A brightness enhancement structure sits on the substrate’s top surface and contains multiple prism portions. Each prism portion includes distributed pores and modified patterns extending downward from its surface. The design combines these features in a film intended to enhance brightness.

Career Highlights

Su’s listed invention focuses on optical materials and light management. The patent’s structure brings together a transmissive substrate, prismatic features, pores, and surface patterns to address brightness enhancement in a light-emitting module.

Collaborations

The information provided associates Su with National Chung Hsing University. No additional collaborators or specific institutional role are identified in the supplied details.

Conclusion

Fang-Hsuan Su’s patent presents a structured brightness enhancement film that combines prismatic portions, internal pores, and modified surface patterns for use with a light-emitting module.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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