Company Filing History:
Years Active: 2004-2006
Title: The Innovations of Fang-Chang Chen
Introduction
Fang-Chang Chen is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 2 patents, Chen has demonstrated his expertise and commitment to advancing technology.
Latest Patents
Chen's latest patents include an "Optical scatterometry method of sidewall spacer analysis." This method involves analyzing the structural characteristics of sidewall spacers fabricated on a wafer. A grating bar with multiple grating targets is utilized to generate a theoretical optical scatterometry spectrum. This spectrum is then compared to an experimental spectrum obtained from the sidewall spacers. The analysis equates the structural characteristics of the sidewall spacers with those of the grating targets when the two spectra match closely.
Another significant patent is the "Method of etching a silicon containing layer using multilayer masks." This innovative method allows for the etching of ultra-small patterns on a silicon-based surface. The process involves successively patterning a hardmask layer and an anti-reflective coating (ARC) over a substrate. The remaining patterned hardmask layer serves as a mask for etching the substrate, enabling precise patterning.
Career Highlights
Fang-Chang Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to contribute to cutting-edge technologies and advancements in semiconductor manufacturing.
Collaborations
Chen has collaborated with esteemed colleagues such as Hun-Jan Tao and Hsien-Kuang Chiu. These collaborations have further enriched his work and have led to significant advancements in their respective fields.
Conclusion
Fang-Chang Chen's contributions to semiconductor technology through his innovative patents highlight his role as a leading inventor in the industry. His work continues to influence advancements in technology and manufacturing processes.