Fan-Wei Lin

Title: Innovations of Fan-Wei Lin

Introduction

Fan-Wei Lin is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of technology, particularly in the area of alignment marks and measurement methods. His innovative approach has led to the development of a unique patent that enhances precision in various applications.

Latest Patents

Fan-Wei Lin holds a patent for an "Alignment mark and measurement method thereof." This invention provides an alignment mark that includes at least one dummy mark pattern in a first layer, which comprises a plurality of dummy mark units arranged along a first direction. Additionally, it features at least one first mark pattern located in a second layer above the first layer. The first mark pattern consists of a plurality of first mark units, each arranged in a first direction. When viewed from above, the first mark pattern completely covers the dummy mark pattern, with each dummy mark unit being smaller than each first mark unit. The design ensures that the first width of each dummy mark unit is smaller than half of the second width of each first mark unit.

Career Highlights

Fan-Wei Lin is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to apply his innovative ideas and contribute to advancements in technology.

Collaborations

Some of his notable coworkers include Chia-Chen Sun and Yu-Cheng Tung. Their collaboration in various projects has further enhanced the innovative environment at United Microelectronics Corporation.

Conclusion

Fan-Wei Lin's contributions to the field of technology through his patent and work at United Microelectronics Corporation highlight his role as an influential inventor. His innovative methods continue to pave the way for advancements in alignment technologies.