Kaohsiung, Taiwan

Fan Wei Lin


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2022

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Fan Wei Lin in Mask Pattern Correction

Introduction

Fan Wei Lin is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of mask pattern correction. His innovative approach addresses critical challenges in the production process, enhancing the quality and reliability of semiconductor devices.

Latest Patents

Fan Wei Lin holds a patent for a "Method for correcting mask pattern and mask pattern thereof." This patent outlines a method that includes providing an original mask pattern with at least one dense pattern area and at least one isolated pattern area. The original mask pattern is divided into a first pattern and a second pattern, where the first pattern is formed in the isolated pattern area and extends to the dense pattern area. The second pattern is formed in the dense pattern area. The method also involves forming at least one slot on at least one section of the first pattern, which is located on at least one transition area between the isolated and dense pattern areas. An optical proximity correction operation is then performed on the first pattern with slots and the second pattern. This innovative approach helps avoid necking or breaking in portions of the post-transfer pattern.

Career Highlights

Fan Wei Lin is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work focuses on improving manufacturing processes and enhancing the performance of semiconductor devices. His expertise in mask pattern correction has positioned him as a valuable asset to his team and the company.

Collaborations

Fan Wei Lin collaborates with talented colleagues, including Chia-Chen Sun and Yu-Cheng Tung. Together, they work on advancing technologies that contribute to the efficiency and effectiveness of semiconductor manufacturing.

Conclusion

Fan Wei Lin's innovative methods in mask pattern correction demonstrate his commitment to improving semiconductor manufacturing processes. His contributions are vital to the ongoing advancements in the industry, ensuring higher quality and reliability in semiconductor devices.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…