Xi'an, China

Fan Wang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Novatek Microelectronics Corp.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fan Wang. Retrieved from https://idiyas.com/inventor/fan-wang-gd6tz329

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Fan Wang

Introduction

Fan Wang is a notable inventor based in Xi'an, China. He has made significant contributions to the field of image processing. His work focuses on developing methods and devices that enhance image filtering techniques.

Latest Patents

Fan Wang holds a patent for a "Method and image processing device for generating image filter." This innovative method involves receiving a first image and inputting it into a pre-trained convolutional neural network (CNN) model. The output from the CNN model is used to obtain the corresponding image filter for the first image. This patent showcases his expertise in leveraging advanced technology to improve image processing.

Career Highlights

Fan Wang is currently employed at Novatek Microelectronics Corporation, where he continues to push the boundaries of innovation in his field. His work at Novatek has allowed him to collaborate with other talented professionals, further enhancing his contributions to technology.

Collaborations

Some of his coworkers include Xi Tian and Xin Huang. Their collaborative efforts contribute to the innovative environment at Novatek Microelectronics Corporation.

Conclusion

Fan Wang's contributions to image processing through his patented methods demonstrate his commitment to innovation. His work not only advances technology but also sets a foundation for future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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