Nanjing, China

Fan Lv

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Nanjing University of Posts and Telecommunications. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fan Lv. Retrieved from https://idiyas.com/inventor/fan-lv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Fan Lv

Introduction

Fan Lv is a notable inventor based in Nanjing, China. He has made significant contributions to the field of engineering, particularly with his innovative designs and inventions. His work focuses on enhancing the efficiency and precision of metal workpiece processing.

Latest Patents

Fan Lv holds a patent for a "Metal workpiece indentation marking device." This device comprises a frame, a striking head, an automatic marking die, a gripper, and a two-dimensional moving mechanism. The design allows the striking head to move up and down, while the automatic marking die is fixedly disposed at the bottom of the striking head. The gripper is equipped with a clamping jaw for securing a metal workpiece, and it can move back and forth or left and right. This functionality enables precise positioning of the metal workpiece under the automatic marking die, ensuring accurate indentation marking.

Career Highlights

Fan Lv is affiliated with Nanjing University of Posts and Telecommunications, where he continues to contribute to research and development in his field. His innovative approach has garnered attention and respect among his peers.

Collaborations

Some of his notable coworkers include Fengyu Xu and Sen Yang, who collaborate with him on various projects and research initiatives.

Conclusion

Fan Lv's contributions to the field of engineering, particularly through his patented inventions, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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