This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Via Technologies, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Innovations of Fan-Hao-Chi Fang in Gas Leak Detection
Introduction
Fan-Hao-Chi Fang is a notable inventor based in New Taipei City, Taiwan. He has made significant contributions to the field of gas leak detection technology. His innovative approach combines advanced sensing techniques with intelligent processing to enhance safety in various environments.
Latest Patents
Fang holds a patent for a gas leak detection device and its corresponding detecting method. This device incorporates a remote temperature sensor that monitors an area by capturing multiple thermal images. Each pixel in these images represents a specific temperature value. The processor analyzes these thermal images to determine the temperature of various environmental blocks. It establishes a temperature judgment threshold and identifies any abnormal temperature readings in designated regions. If an anomaly is detected, the device initiates a warning operation to alert users.
Career Highlights
Fang is currently employed at Via Technologies, Inc., where he continues to develop innovative solutions in technology. His work focuses on enhancing safety measures through effective detection systems. With a patent portfolio that includes 1 patent, he demonstrates a commitment to advancing technology in practical applications.
Collaborations
Fang collaborates with Ting-Yuan Chang, contributing to the development of cutting-edge technologies in their field. Their partnership exemplifies the importance of teamwork in driving innovation.
Conclusion
Fan-Hao-Chi Fang's contributions to gas leak detection technology highlight his role as an inventor dedicated to improving safety through innovation. His work at Via Technologies, Inc. and his patented device reflect his commitment to advancing technology for practical use.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
