Xi'an, China

Fan Chen

This inventor holds 1 USPTO granted patent. Top assignees: Xi'an Eswin Material Technology Co., Ltd., Xi'an Eswin Silicon Wafer Technology Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fan Chen. Retrieved from https://idiyas.com/inventor/fan-chen-z44ffj25

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations in Silicon Material Processing by Fan Chen

Introduction

Fan Chen is a notable inventor based in Xi'an, China. He has made significant contributions to the field of silicon material processing. His innovative approach has led to the development of advanced technologies that enhance the efficiency of silicon production.

Latest Patents

Fan Chen holds a patent for a silicon material processing apparatus, silicon ingot production equipment, and a silicon material processing method. This apparatus includes a feed assembly, a scanning assembly, a controller, and a loading assembly. The feed assembly is designed to convey silicon material and consists of a feeding area, a scanning area, and a loading area arranged sequentially along the conveying direction. The scanning assembly collects silicon material information, including shape and size characteristics, which the controller uses to generate a loading strategy.

Career Highlights

Throughout his career, Fan Chen has worked with prominent companies in the technology sector. He has been associated with Xi'an Eswin Material Technology Co., Ltd. and Xi'an Eswin Silicon Wafer Technology Co., Ltd. His work in these organizations has been instrumental in advancing silicon processing technologies.

Collaborations

Fan Chen has collaborated with several professionals in his field, including Pengju Zhang and Chaochao Guo. These collaborations have fostered innovation and contributed to the development of cutting-edge technologies in silicon material processing.

Conclusion

Fan Chen's contributions

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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