This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Micro-Epsilon Messtechnik Gmbh & Co. Kg. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006
Title: Falk Roewer: Innovator in Measurement Technology
Introduction
Falk Roewer is a notable inventor based in Magdeburg, Germany. He has made significant contributions to the field of measurement technology, holding two patents that showcase his innovative approach to circuit design and signal processing.
Latest Patents
Falk Roewer's latest patents include a "Circuit and method for measuring distances" and a "Demodulation circuit." The first patent describes a circuit designed for measuring distances, featuring at least two inputs, a measuring coil, and a signal source. This circuit is particularly useful in environments where space is limited, as it generates a measuring output signal that is temperature-dependent. The second patent focuses on a circuit and method for demodulating modulated signals, such as those from sensors. This circuit is also designed to function effectively in small spaces, utilizing a switched-capacitor network for signal demodulation.
Career Highlights
Falk Roewer is currently employed at Micro-Epsilon Messtechnik GmbH & Co. KG, a company renowned for its precision measurement technology. His work at this organization has allowed him to develop and refine his innovative ideas, contributing to advancements in measurement solutions.
Collaborations
Falk Roewer collaborates with esteemed colleagues, including Ulrich Kleine and Klaus Salzwedel. Their combined expertise fosters a creative environment that enhances the development of cutting-edge technologies.
Conclusion
Falk Roewer's contributions to measurement technology through his patents and work at Micro-Epsilon Messtechnik GmbH & Co. KG highlight his role as an influential inventor. His innovative circuits and methods continue to impact the field positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
