Ingersheim, Germany

Falk Hatzfeld

This inventor holds 1 USPTO granted patent and 3 published patent applications and 1 EPO patent. Top assignee: Durr Dental Se. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Falk Hatzfeld. Retrieved from https://idiyas.com/inventor/falk-hatzfeld

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Falk Hatzfeld: Innovator in Sensor Technology

Introduction

Falk Hatzfeld is a notable inventor based in Ingersheim, Germany. He has made significant contributions to the field of sensor technology, particularly in air compressor systems. His innovative approach has led to the development of a unique sensors unit that enhances the functionality of air compressors.

Latest Patents

Hatzfeld holds a patent for a "Sensors unit and air compressor system with such a sensors unit." This invention features a pressure measuring unit for measuring pressure, along with at least one additional measuring unit for assessing other physical and/or chemical quantities. The system includes an evaluation and control unit designed to manage both measuring units and provide measurement data through an external interface.

Career Highlights

Falk Hatzfeld is currently associated with Durr Dental SE, where he applies his expertise in sensor technology. His work at the company has allowed him to focus on developing advanced solutions that improve the efficiency and accuracy of air compressor systems.

Conclusion

Falk Hatzfeld's contributions to sensor technology exemplify the innovative spirit of modern inventors. His patent for a sensors unit demonstrates his commitment to enhancing industrial applications, particularly in air compressor systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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