Mortsel, Belgium

Faïma Lazreg

This inventor holds 1 USPTO granted patent and 6 published patent applications and 3 EPO patents. Top assignee: Eco3 Bv. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Faïma Lazreg. Retrieved from https://idiyas.com/inventor/faima-lazreg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Faïma Lazreg - Innovator in Lithographic Printing Technology

Introduction: Faïma Lazreg is an accomplished inventor based in Mortsel, Belgium. He is currently associated with Eco3 Bv, where he contributes to advancements in lithographic printing technology. Despite having no granted patents to his name, his work in the field is noteworthy.

Latest Patent Applications: Faïma Lazreg has submitted several patent applications related to lithographic printing plates. One of his latest applications is for a lithographic printing plate precursor that includes a support and a coating comprising a photopolymerisable layer. This layer contains a polymerisable compound, a photoinitiator, and an infrared absorbing compound with a long chain linear or branched alkyl group. Another application focuses on a lithographic printing plate precursor that features a coating on a support, which includes a photopolymerisable layer with a polymerisable compound, a first infrared absorbing dye, and a photoinitiator. Additionally, it has a top layer above the photopolymerisable layer that includes a second infrared absorbing compound capable of forming a print-out image upon exposure to heat and/or infrared radiation.

Conclusion: Faïma Lazreg is a dedicated inventor making strides in the lithographic printing industry through his innovative patent applications. His contributions, although not yet reflected in granted patents, showcase his commitment to advancing technology in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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