Birmingham, United Kingdom

Fabian Gruber

This inventor holds 1 USPTO granted patent. Top assignee: Arm Limited. Active years: 2025.


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Fabian Gruber - Innovator in Cache Hierarchy Technology.

Introduction

Fabian Gruber is a notable inventor based in Birmingham, GB. He has made significant contributions to the field of cache hierarchy technology, particularly through his innovative patent.

Latest Patents

Fabian Gruber holds a patent titled "Linefill delegation in a cache hierarchy." This patent discloses apparatuses, methods, systems, and chip-containing products that relate to an arrangement comprising a level N cache level and a level M cache level, where M is greater than N. The level N cache level includes a plurality of linefill slots and performs a slot allocation procedure in response to a lookup miss, depending on a linefill slot occupancy criterion. The slot allocation procedure involves allocating an available slot of the plurality of slots to a pending linefill request generated due to the lookup miss. Furthermore, the level N cache level modifies the slot allocation procedure based on the linefill slot occupancy criterion and is responsive to this criterion being fulfilled, which instructs a linefill delegation action to the level M cache level.

Career Highlights

Fabian Gruber is currently associated with Arm Limited, a leading company in semiconductor and software design. His work at Arm Limited has allowed him to explore and develop advanced technologies that enhance cache performance and efficiency.

Collaborations

Fabian collaborates with talented individuals such as Kamil Garifullin and Stefano Ghiggini, contributing to innovative projects and advancements in technology.

Conclusion

Fabian Gruber's contributions to cache hierarchy technology through his patent demonstrate his expertise and commitment to innovation in the field. His work continues to influence advancements in semiconductor technology.

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