F Read McFeely

Title: **F Read McFeely: Innovator in Advanced Material Deposition Technologies**

Introduction

F Read McFeely, an accomplished inventor from Ossining, NY, has significantly contributed to the field of materials science with his innovative inventions. With a total of two patents to his name, McFeely specializes in advanced delivery systems for gases and methods for enhancing the morphology of thin films. His work continues to push the boundaries of technology in various industrial applications.

Latest Patents

McFeely's latest patents showcase his expertise in chemical vapor deposition (CVD) techniques. The first patent, titled "Delivery systems for gases via the sublimation of solid precursors," introduces a novel method for depositing metals or other materials onto substrates. This process involves the introduction of a solid precursor into a liquid within a bubbler apparatus, generating vapors that are then swept by a carrier gas into a reactor for coating.

The second patent, "Method for improving the morphology of refractory metal thin films," details a method to produce smoother surfaces for refractory metallic materials. This technique requires the placement of a substrate in a CVD reactor, concurrent introduction of a precursor gas and molecular oxygen, followed by annealing the deposited layer at the temperature of deposition. Together, these patents reflect McFeely's innovative approach to improving material properties via advanced deposition techniques.

Career Highlights

F Read McFeely has developed his career at the prestigious International Business Machines Corporation (IBM), where he has played a crucial role in research and development. His focus on enhancing deposition methods has not only led to groundbreaking patents but has also solidified his reputation as an industry expert. McFeely's contributions are pivotal in the field of semiconductor processing and thin-film technology.

Collaborations

Throughout his career, McFeely has collaborated with esteemed colleagues such as John Jacob Yurkas and Russell D Allen. These partnerships within IBM have fostered a creative environment where innovative ideas can thrive, ultimately enhancing the impact of their collective work on technology and industry.

Conclusion

F Read McFeely stands as a prominent figure in the realm of materials science, with his patents reflecting his dedication to innovation and technological advancement. His work at IBM and collaborations with other professionals in the field continues to shape the future of material deposition technologies, promising exciting developments ahead.