Colle Umberto, Italy

Ezio Chies


Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 114(Granted Patents)


Location History:

  • Colle Umberto, IT (1996 - 1998)
  • Vittorio Veneto, IT (2003)

Company Filing History:


Years Active: 1996-2003

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3 patents (USPTO):Explore Patents

Title: The Innovations of Ezio Chies

Introduction

Ezio Chies is a notable inventor based in Colle Umberto, Italy. He has made significant contributions to the field of key duplication technology, holding a total of three patents. His work has been instrumental in improving the efficiency and accuracy of key duplicating machines.

Latest Patents

One of his latest patents is a clamp for a key duplicating machine. This improved clamp features a pair of jaws that can approach each other to define at least one seat for clamping a key. It also includes a gauge that can be associated with the seat to ensure the correct positioning of the key. A counteracting element is slidingly associated with the gauge, which interferes with the seat when the gauge is in its operating condition, providing support for the tip of the key housed in the seat. Another significant patent is for a duplicating machine specifically designed for punched and laser keys. These innovations reflect his commitment to enhancing the functionality of key duplication processes.

Career Highlights

Ezio Chies is currently employed at Silca S.p.a., a company renowned for its expertise in key duplication and security solutions. His role at Silca has allowed him to further develop his innovative ideas and contribute to the advancement of key technology.

Collaborations

Throughout his career, Ezio has collaborated with talented individuals such as Eros Foscan and Federico Marcon. These partnerships have fostered a creative environment that encourages the development of cutting-edge solutions in the industry.

Conclusion

Ezio Chies is a distinguished inventor whose work in key duplication technology has led to significant advancements in the field. His patents and contributions continue to influence the industry, showcasing his dedication to innovation and excellence.

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