Lisle, IL, United States of America

Eyad Hajissa

This inventor holds 2 USPTO granted patents. Top assignee: Rehabilitation Institute of Chicago. Active years: 2019-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eyad Hajissa. Retrieved from https://idiyas.com/inventor/eyad-hajissa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019-2020

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2 patents (USPTO):Explore Patents

Title: Eyad Hajissa: Innovator in Rehabilitation Technology

Introduction

Eyad Hajissa is a notable inventor based in Lisle, Illinois, who has made significant contributions to the field of rehabilitation technology. With a total of two patents to his name, he has demonstrated a commitment to improving the lives of individuals through innovative solutions.

Latest Patents

Eyad's latest patents include a unique frame designed to enhance rehabilitation processes. This invention reflects his dedication to creating tools that facilitate recovery and improve patient outcomes.

Career Highlights

Eyad Hajissa is currently employed at the Rehabilitation Institute of Chicago, where he applies his expertise in developing advanced rehabilitation technologies. His work at this esteemed institution underscores his role as a leader in the field.

Collaborations

Throughout his career, Eyad has collaborated with talented individuals such as James L. Patton and Felix Charles Huang. These partnerships have allowed him to expand his innovative efforts and contribute to the development of effective rehabilitation solutions.

Conclusion

Eyad Hajissa's contributions to rehabilitation technology through his patents and collaborations highlight his impact on the field. His work continues to inspire advancements that benefit patients and healthcare professionals alike.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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