This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 1978.
Company Filing History:
Years Active: 1978
Title: Ewald Klein - Innovator in X-ray Electrophotographic Technology
Introduction
Ewald Klein is a notable inventor based in Aachen, Germany. He is recognized for his contributions to the field of electrophotography, particularly in the development of X-ray recording materials. His innovative work has led to advancements in the sensitivity of photoconductive layers, which are crucial for various imaging technologies.
Latest Patents
Ewald Klein holds a patent for an X-ray electrophotographic recording material and a method of manufacturing it. This patent focuses on enhancing the sensitivity of photoconductive layers made from tetragonal lead monoxide. The process involves treating the lead monoxide to achieve a grain size of 1 to 50 micrometers, which is then dispersed in a binder without mechanical force and sedimented on a layer carrier.
Career Highlights
Klein has made significant strides in his career, particularly through his work at U.S. Philips Corporation. His innovative approach to electrophotographic materials has positioned him as a key figure in the industry. His research has not only contributed to the advancement of technology but has also paved the way for future innovations in imaging.
Collaborations
Throughout his career, Ewald Klein has collaborated with esteemed colleagues such as Horst Dannert and Hans-Jurgen Hirsch. These collaborations have fostered a productive environment for innovation and have led to significant advancements in their respective fields.
Conclusion
Ewald Klein's contributions to the field of electrophotography exemplify the impact of innovative thinking in technology. His patent and collaborative efforts continue to influence advancements in imaging technologies.