Company Filing History:
Years Active: 2001
Title: The Innovations of Ewa B Oldak in Microelectronics Cleaning Solutions
Introduction
Ewa B Oldak, a talented inventor based in Bethlehem, PA, has made significant contributions to the field of microelectronics. With a focus on enhancing cleaning processes for copper-containing substrates, Ewa has developed innovative solutions critical to the performance of microelectronic devices.
Latest Patents
Ewa B Oldak holds a patent for a novel cleaning composition designed for post-chemical-mechanical planarization (CMP) cleaning of microelectronic substrates. This unique cleaning solution comprises a quaternary ammonium hydroxide, an organic amine, a corrosion inhibitor, and water. Specifically, it includes tetramethylammonium hydroxide, monoethanolamine, gallic acid, and water, all crafted to ensure optimal cleaning efficiency with a pH level greater than 10.
Career Highlights
Currently, Ewa is associated with Esc Inc., where she applies her expertise to further enhance the cleaning technologies used in the microelectronics industry. Her work has not only advanced the standard cleaning practices but also improved the overall quality and reliability of the microelectronic devices that utilize her innovative solutions.
Collaborations
Throughout her career, Ewa has collaborated with notable professionals, including Shahriar Naghshineh and Jeff Barnes. These partnerships have enabled her to bridge knowledge and skills, resulting in the successful development of cleaning solutions that address industry needs effectively.
Conclusion
Ewa B Oldak stands out as a pioneering inventor in microelectronics cleaning technology. Her patented cleaning composition showcases her dedication to innovation and quality in the field. As she continues to contribute to advancements at Esc Inc., her work remains pivotal in shaping the future of microelectronic manufacturing processes.