Company Filing History:
Years Active: 2004-2008
Title: Evgueny E Egorov: Innovator in Optical Proximity Correction
Introduction
Evgueny E Egorov is a prominent inventor based in Moscow, Russia. He has made significant contributions to the field of optical proximity correction (OPC) with a total of 4 patents to his name. His work focuses on improving the quality and efficiency of integrated circuit designs.
Latest Patents
One of his latest patents is titled "Method and system for analyzing the quality of an OPC mask." This invention provides a comprehensive method for analyzing the quality of an OPC mask by classifying cells in the target layer and the OPC mask layer. It includes recognizing geometric points to determine quality measuring groups and simulating the OPC mask layer based on these groups. Another notable patent is "Method and system for constructing a hierarchy-driven chip covering for optical proximity correction." This invention outlines a method for performing OPC on an integrated circuit chip design, which significantly reduces the amount of data evaluated and the number of corrections performed, leading to substantial savings in computing resources and time.
Career Highlights
Evgueny E Egorov is currently employed at LSI Logic Corporation, where he continues to innovate in the field of semiconductor technology. His expertise in optical proximity correction has positioned him as a valuable asset in the industry.
Collaborations
Throughout his career, Evgueny has collaborated with notable colleagues, including Stanislav V Aleshin and Ranko L Scepanovic. These collaborations have further enhanced his contributions to the field.
Conclusion
Evgueny E Egorov is a distinguished inventor whose work in optical proximity correction has made a significant impact on integrated circuit design. His innovative patents and career at LSI Logic Corporation highlight his dedication to advancing technology in this critical area.