This inventor holds 9 USPTO granted patents. Top assignees: Novellus Systems Incorporated, Siliconix Incorporated, Other. Active years: 1993-1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Saratoga, CA (US) (1997)
- Cupertino, CA (US) (1993 - 1999)
Company Filing History:
7 out of 993 
1 out of 256 
1 out of 834,453 Years Active: 1993-1999
Title: Innovations by Everhardus P Van De Ven
Introduction
Everhardus P Van De Ven is a notable inventor based in Cupertino, California. He holds a total of nine patents, showcasing his significant contributions to the field of chemical vapor deposition technology. His work primarily focuses on improving processes related to substrate deposition protection.
Latest Patents
One of his latest patents involves a gas-based substrate deposition protection system. This invention features a platen that supports a substrate during the deposition of materials such as tungsten and metal nitrides in a chemical vapor deposition reactor. The system introduces a deposition control gas, which is composed of inert gases like argon or a mixture of inert and reactive gases. This gas is introduced through a restrictive opening, ensuring a uniform flow that prevents process gas access to the substrate edge and backside. Another patent describes an apparatus designed to prevent deposition on the frontside peripheral region of a wafer. This invention also utilizes a deposition control gas and includes an exclusion guard that aligns with the platen, providing a uniform pressure of gas to protect the wafer's edges.
Career Highlights
Throughout his career, Everhardus has worked with prominent companies such as Novellus Systems Incorporated and Siliconix Incorporated. His experience in these organizations has allowed him to develop and refine his innovative ideas in the field of semiconductor manufacturing.
Collaborations
He has collaborated with notable coworkers, including Eliot K Broadbent and Jeffrey C Benzing. These partnerships have contributed to the advancement of his inventions and the overall progress in the industry.
Conclusion
Everhardus P Van De Ven's contributions to the field of chemical vapor deposition technology are significant. His innovative patents and collaborations reflect his dedication to advancing semiconductor manufacturing processes. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile