Hsinchu, Taiwan

Evance Kuo

This inventor holds 2 USPTO granted patents. Top assignee: Showa Denko K.k.. Active years: 2018-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Evance Kuo. Retrieved from https://idiyas.com/inventor/evance-kuo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018-2020

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2 patents (USPTO):Explore Patents

Title: Evance Kuo: Innovator in Magnetic Recording Technology

Introduction

Evance Kuo is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of magnetic recording technology. With a focus on innovative solutions, Kuo has been instrumental in developing advanced magnetic recording mediums.

Latest Patents

Kuo holds 2 patents related to magnetic recording technology. His latest patents include a magnetic recording medium that features a lubricant layer containing specific compounds. The first patent describes a magnetic recording medium where the lubricant layer includes a compound A and a compound B, with a specific mass ratio and thickness. The second patent focuses on a magnetic recording medium with a protective layer that contains carbon and nitrogen, ensuring optimal performance and durability.

Career Highlights

Evance Kuo is currently employed at Showa Denko K.K., where he continues to push the boundaries of innovation in magnetic recording technology. His work has been recognized for its potential to enhance data storage solutions.

Collaborations

Kuo has collaborated with notable colleagues such as Satoru Nakamura and Taining Hung. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Evance Kuo's contributions to magnetic recording technology exemplify his commitment to innovation. His patents reflect a deep understanding of materials and their applications in modern technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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