Eva Vermeiren

Title: Eva Vermeiren: Innovator in Lithographic Printing Technology

Introduction

Eva Vermeiren is a prominent inventor based in Mortsel, Belgium. She has made significant contributions to the field of lithographic printing technology, holding two patents that showcase her innovative spirit and technical expertise.

Latest Patents

Her latest patents include a "Lithographic photopolymer printing plate precursor with improved daylight stability." This invention features a support, a photopolymerizable image recording layer, and an overcoat that contains a low-molecular radical inhibitor. After image-wise exposure, the plate is heated, allowing the radical inhibitor to diffuse from the overcoat to the image recording layer. This process enhances the daylight stability of the exposed and heated precursor, making it particularly suitable for on-press processing. Another notable patent is the "Lithographic printing plate precursor," which includes a support and a coating comprising a photopolymerizable layer with a polymerizable compound and a photoinitiator. The toplayer in this invention has a specific thickness and includes an infrared absorbing compound that transforms upon exposure to heat and/or IR radiation, enabling the formation of a printout image.

Career Highlights

Throughout her career, Eva has worked with notable companies such as Eco3 Bv and Agfa Offset Bv. Her experience in these organizations has allowed her to refine her skills and contribute to advancements in printing technology.

Collaborations

Eva has collaborated with talented individuals, including Thomas Billiet and Katleen Himschoot, who have supported her innovative endeavors.

Conclusion

Eva Vermeiren stands out as a key figure in the lithographic printing industry, with her patents reflecting her commitment to innovation and excellence. Her work continues to influence the field and inspire future advancements in printing technology.