Company Filing History:
Years Active: 2018-2024
Title: Eunwoo Lee - Innovator in Substrate Processing Technologies
Introduction
Eunwoo Lee is a prominent inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of semiconductor processing, holding a total of 3 patents. His work focuses on innovative methods and systems that enhance the efficiency and effectiveness of substrate processing apparatuses.
Latest Patents
Eunwoo Lee's latest patents include a "Method and system for monitoring substrate processing apparatus." This invention involves applying high-frequency and low-frequency radio frequency power signals to an electrostatic chuck within a process chamber. The method also incorporates measuring voltage values at specific points to monitor the state of the edge ring by comparing a threshold with the voltage ratio. Another notable patent is the "Method of etching substrate," which describes a process for forming patterns on semiconductor devices. This method includes creating a photoresist pattern and utilizing it as an etch mask to etch portions of the substrate.
Career Highlights
Eunwoo Lee is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work at Samsung has allowed him to develop cutting-edge technologies that contribute to advancements in semiconductor manufacturing.
Collaborations
Eunwoo collaborates with talented coworkers, including Jongwoo Sun and Sangrok Oh, who share his commitment to innovation in the field of semiconductor technology.
Conclusion
Eunwoo Lee's contributions to substrate processing technologies demonstrate his expertise and dedication to advancing the semiconductor industry. His innovative patents reflect a deep understanding of the complexities involved in semiconductor manufacturing.