Hwaseong, South Korea

Eunsoo Lee

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eunsoo Lee. Retrieved from https://idiyas.com/inventor/eunsoo-lee-06e68rsg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Eunsoo Lee - Innovator in Plasma Technology

Introduction

Eunsoo Lee is a notable inventor based in Hwaseong, South Korea. He has made significant contributions to the field of plasma technology, particularly through his innovative patent.

Latest Patents

Eunsoo Lee holds a patent for a "Plasma monitoring apparatus and plasma processing apparatus including the same." This invention features a flow control portion with two distinct ports for the introduction and discharge of emission light from plasma. It also includes a transparent glass window that allows the passage of emission light and a spectroscopic apparatus connected via an optical fiber to detect the intensity of the emission light. This patent showcases his expertise in developing advanced monitoring systems for plasma applications. He has 1 patent to his name.

Career Highlights

Eunsoo Lee is currently employed at Samsung Display Co., Ltd., where he continues to work on innovative technologies that enhance plasma processing capabilities. His role at such a prominent company underscores his importance in the field of display technology.

Collaborations

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Conclusion

Eunsoo Lee's contributions to plasma technology through his patent and work at Samsung Display Co., Ltd. highlight his role as an influential inventor in the industry. His innovative spirit continues to drive advancements in plasma monitoring and processing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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