Company Filing History:
Years Active: 2018
Title: Eunsol Shin: Innovator in Semiconductor Technology
Introduction
Eunsol Shin is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods of forming hard mask layers.
Latest Patents
Eunsol Shin holds a patent titled "Methods of forming a hard mask layer and of fabricating a semiconductor device using the same." This patent describes a method of forming a hard mask layer on a substrate by utilizing nitrous oxide (NO) to create an amorphous carbon layer. The process involves introducing a source of carbon and nitrous oxide under a plasma ambient of an inert gas. The resulting amorphous carbon layer contains a nitrogen content ranging from about 0.05 at % to about 30 at % and an oxygen content ranging from about 0.05 at % to about 10 at %. This innovative approach is crucial in the fabrication of semiconductor devices, where the hard mask layer is patterned and used as an etch mask for the target layer beneath.
Career Highlights
Eunsol Shin is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work at Samsung has positioned him as a key player in advancing semiconductor technologies.
Collaborations
Eunsol has collaborated with talented coworkers, including Sejun Park and Dohyung Kim, who contribute to the innovative environment at Samsung Electronics.
Conclusion
Eunsol Shin's contributions to semiconductor technology through his patent and work at Samsung Electronics highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor fabrication.